Sozaraj Rasappa
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Citado por
A facile route to synthesis of S-doped TiO2 nanoparticles for photocatalytic activity
C McManamon, J O'Connell, P Delaney, S Rasappa, JD Holmes, ...
Journal of Molecular Catalysis A: Chemical 406, 51-57, 2015
Plasma etch technologies for the development of ultra-small feature size transistor devices
D Borah, MT Shaw, S Rasappa, RA Farrell, C O'Mahony, CM Faulkner, ...
Journal of Physics D: Applied Physics 44 (17), 174012, 2011
Swift Nanopattern Formation of PS-b-PMMA and PS-b-PDMS Block Copolymer Films Using a Microwave Assisted Technique
D Borah, R Senthamaraikannan, S Rasappa, B Kosmala, JD Holmes, ...
Acs Nano 7 (8), 6583-6596, 2013
Molecularly Functionalized Silicon Substrates for Orientation Control of the Microphase Separation of PS-b-PMMA and PS-b-PDMS Block Copolymer Systems
D Borah, M Ozmen, S Rasappa, MT Shaw, JD Holmes, MA Morris
Langmuir 29 (9), 2809-2820, 2013
Study of the kinetics and mechanism of rapid self-assembly in block copolymer thin films during solvo-microwave annealing
P Mokarian-Tabari, C Cummins, S Rasappa, C Simao, ...
Langmuir 30 (35), 10728-10739, 2014
Fabrication of a sub-10 nm silicon nanowire based ethanol sensor using block copolymer lithography
S Rasappa, D Borah, CC Faulkner, T Lutz, MT Shaw, JD Holmes, ...
Nanotechnology 24 (6), 065503, 2013
Orientation and Alignment Control of Microphase-Separated PS-b-PDMS Substrate Patterns via Polymer Brush Chemistry
D Borah, S Rasappa, R Senthamaraikannan, B Kosmala, MT Shaw, ...
ACS Applied Materials & Interfaces 5 (1), 88-97, 2013
Self-assembly of polystyrene-block-poly (4-vinylpyridine) block copolymer on molecularly functionalized silicon substrates: fabrication of inorganic nanostructured etchmask for …
C Cummins, D Borah, S Rasappa, A Chaudhari, T Ghoshal, ...
Journal of Materials Chemistry C 1 (47), 7941-7951, 2013
High quality sub-10 nm graphene nanoribbons by on-chip PS-b-PDMS block copolymer lithography
S Rasappa, JM Caridad, L Schulte, A Cagliani, D Borah, MA Morris, ...
Rsc Advances 5 (82), 66711-66717, 2015
High molecular weight block copolymer lithography for nanofabrication of hard mask and photonic nanostructures
S Rasappa, H Hulkkonen, L Schulte, S Ndoni, J Reuna, T Salminen, ...
Journal of colloid and interface science 534, 420-429, 2019
Block copolymer lithography: feature size control and extension by an over-etch technique
S Rasappa, D Borah, R Senthamaraikannan, CC Faulkner, MT Shaw, ...
Thin Solid Films 522, 318-323, 2012
Soft Graphoepitaxy for Large Area Directed Self‐Assembly of Polystyrene‐block‐Poly(dimethylsiloxane) Block Copolymer on Nanopatterned POSS Substrates …
D Borah, S Rasappa, M Salaun, M Zellsman, O Lorret, G Liontos, ...
Advanced Functional Materials 25 (22), 3425-3432, 2015
Nanopatterning via Self-Assembly of a Lamellar-Forming Polystyrene-block-Poly(dimethylsiloxane) Diblock Copolymer on Topographical Substrates Fabricated by …
D Borah, C Cummins, S Rasappa, R Senthamaraikannan, M Salaun, ...
Nanomaterials 8 (1), 32, 2018
Rapid, brushless self-assembly of a PS-b-PDMS block copolymer for nanolithography
S Rasappa, L Schulte, D Borah, MA Morris, S Ndoni
Colloids and Interface Science Communications 2, 1-5, 2014
The sensitivity of random polymer brush-lamellar polystyrene-b-polymethylmethacrylate block copolymer systems to process conditions
D Borah, S Rasappa, R Senthamaraikannan, MT Shaw, JD Holmes, ...
Journal of colloid and interface science 393, 192-202, 2013
Morphology evolution of PS-b-PDMS block copolymer and its hierarchical directed self-assembly on block copolymer templates
S Rasappa, L Schulte, D Borah, H Hulkkonen, S Ndoni, T Salminen, ...
Microelectronic Engineering 192, 1-7, 2018
Soft-graphoepitaxy using nanoimprinted polyhedral oligomeric silsesquioxane substrates for the directed self-assembly of PS-b-PDMS
D Borah, CD Simao, R Senthamaraikannan, S Rasappa, A Francone, ...
European polymer journal 49 (11), 3512-3521, 2013
Tuning PDMS Brush Chemistry by UV–O3 Exposure for PS-b-PDMS Microphase Separation and Directed Self-assembly
D Borah, S Rasappa, R Senthamaraikannan, JD Holmes, MA Morris
Langmuir 29 (28), 8959-8968, 2013
A highly efficient sensor platform using simply manufactured nanodot patterned substrates
S Rasappa, T Ghoshal, D Borah, R Senthamaraikannan, JD Holmes, ...
Scientific Reports 5 (1), 13270, 2015
Directed self-assembly of a high-chi block copolymer for the fabrication of optical nanoresonators
S Rasappa, L Schulte, S Ndoni, T Niemi
Nanoscale 10 (38), 18306-18314, 2018
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Artículos 1–20