| Surface-modified carbon black for As (V) removal D Borah, S Satokawa, S Kato, T Kojima Journal of colloid and interface science 319 (1), 53-62, 2008 | 151 | 2008 |
| Sorption of As (V) from aqueous solution using acid modified carbon black D Borah, S Satokawa, S Kato, T Kojima Journal of Hazardous Materials 162 (2-3), 1269-1277, 2009 | 141 | 2009 |
| Chemical interactions and their role in the microphase separation of block copolymer thin films RA Farrell, TG Fitzgerald, D Borah, JD Holmes, MA Morris International journal of molecular sciences 10 (9), 3671-3712, 2009 | 119 | 2009 |
| Adsorption of Cd (II) from aqueous solution onto pyrite D Borah, K Senapati Fuel 85 (12-13), 1929-1934, 2006 | 114 | 2006 |
| Plasma etch technologies for the development of ultra-small feature size transistor devices D Borah, MT Shaw, S Rasappa, RA Farrell, C O'Mahony, CM Faulkner, ... Journal of Physics D: Applied Physics 44 (17), 174012, 2011 | 100 | 2011 |
| Sub-10 nm Feature Size PS-b-PDMS Block Copolymer Structures Fabricated by a Microwave-Assisted Solvothermal Process D Borah, MT Shaw, JD Holmes, MA Morris ACS Applied Materials & Interfaces 5 (6), 2004-2012, 2013 | 90 | 2013 |
| Characterization of chemically modified carbon black for sorption application D Borah, S Satokawa, S Kato, T Kojima Applied Surface Science 254 (10), 3049-3056, 2008 | 87 | 2008 |
| Swift Nanopattern Formation of PS-b-PMMA and PS-b-PDMS Block Copolymer Films Using a Microwave Assisted Technique D Borah, R Senthamaraikannan, S Rasappa, B Kosmala, JD Holmes, ... Acs Nano 7 (8), 6583-6596, 2013 | 83 | 2013 |
| Aligned silicon nanofins via the directed self-assembly of PS-b-P4VP block copolymer and metal oxide enhanced pattern transfer C Cummins, A Gangnaik, RA Kelly, D Borah, J O'Connell, N Petkov, ... Nanoscale 7 (15), 6712-6721, 2015 | 67 | 2015 |
| Oxidation of high sulphur coal. Part 2. Desulphurisation of organic sulphur by hydrogen peroxide in presence of metal ions D Borah, MK Baruah, I Haque Fuel 80 (10), 1475-1488, 2001 | 61 | 2001 |
| Electrochemical sensing of hydrogen peroxide using block copolymer templated iron oxide nanopatterns SZ Bas, C Cummins, D Borah, M Ozmen, MA Morris Analytical chemistry 90 (2), 1122-1128, 2018 | 52 | 2018 |
| Dependence of pyrite concentration on kinetics and thermodynamics of coal pyrolysis in non-isothermal systems D Borah, M Barua, MK Baruah Fuel processing technology 86 (9), 977-993, 2005 | 50 | 2005 |
| Oxidation of high sulphur coal. Part 1. Desulphurisation and evidence of the formation of oxidised organic sulphur species D Borah, MK Baruah, I Haque Fuel 80 (4), 501-507, 2001 | 48 | 2001 |
| Molecularly Functionalized Silicon Substrates for Orientation Control of the Microphase Separation of PS-b-PMMA and PS-b-PDMS Block Copolymer Systems D Borah, M Ozmen, S Rasappa, MT Shaw, JD Holmes, MA Morris Langmuir 29 (9), 2809-2820, 2013 | 46 | 2013 |
| A novel electrochemical sensor based on metal ion infiltrated block copolymer thin films for sensitive and selective determination of dopamine SZ Bas, C Cummins, A Selkirk, D Borah, M Ozmen, MA Morris ACS Applied Nano Materials 2 (11), 7311-7318, 2019 | 41 | 2019 |
| Fabrication of a sub-10 nm silicon nanowire based ethanol sensor using block copolymer lithography S Rasappa, D Borah, CC Faulkner, T Lutz, MT Shaw, JD Holmes, ... Nanotechnology 24 (6), 065503, 2013 | 41 | 2013 |
| Orientation and Alignment Control of Microphase-Separated PS-b-PDMS Substrate Patterns via Polymer Brush Chemistry D Borah, S Rasappa, R Senthamaraikannan, B Kosmala, MT Shaw, ... ACS Applied Materials & Interfaces 5 (1), 88-97, 2013 | 41 | 2013 |
| Self-assembly of polystyrene-block-poly (4-vinylpyridine) block copolymer on molecularly functionalized silicon substrates: fabrication of inorganic nanostructured etchmask for … C Cummins, D Borah, S Rasappa, A Chaudhari, T Ghoshal, ... Journal of Materials Chemistry C 1 (47), 7941-7951, 2013 | 40 | 2013 |
| Electron transfer process: 1. Removal of organic sulphur from high sulphur Indian coal D Borah, MK Baruah Fuel 78 (9), 1083-1088, 1999 | 40 | 1999 |
| Fabrication of highly ordered sub-20 nm silicon nanopillars by block copolymer lithography combined with resist design M Salaun, M Zelsmann, S Archambault, D Borah, N Kehagias, C Simao, ... Journal of Materials Chemistry C 1 (22), 3544-3550, 2013 | 33 | 2013 |
