Imprint mold and method for making using sidewall spacer line doubling H Gao, JS Lille, L Wan US Patent App. 13/772,642, 2014 | 488 | 2014 |
Method for making a chemical contrast pattern using block copolymers and sequential infiltration synthesis YA Chapuis, R Ruiz, L Wan US Patent 8,900,467, 2014 | 392 | 2014 |
Nanoscale chemical imaging by photoinduced force microscopy D Nowak, W Morrison, HK Wickramasinghe, J Jahng, E Potma, L Wan, ... Science advances 2 (3), e1501571, 2016 | 301 | 2016 |
Bit-patterned magnetic recording: Theory, media fabrication, and recording performance TR Albrecht, H Arora, V Ayanoor-Vitikkate, JM Beaujour, D Bedau, ... IEEE Transactions on Magnetics 51 (5), 1-42, 2015 | 266 | 2015 |
Directed self-assembly of block copolymers on chemical patterns: A platform for nanofabrication S Ji, L Wan, CC Liu, PF Nealey Progress in Polymer Science 54, 76-127, 2016 | 217 | 2016 |
The Limits of Lamellae-Forming PS-b-PMMA Block Copolymers for Lithography L Wan, R Ruiz, H Gao, KC Patel, TR Albrecht, J Yin, J Kim, Y Cao, G Lin ACS nano 9 (7), 7506-7514, 2015 | 159 | 2015 |
Directed Block Copolymer Assembly versus Electron Beam Lithography for Bit-Patterned Media with Areal Density of 1 Terabit/inch2 and Beyond XM Yang, L Wan, S Xiao, Y Xu, DK Weller Acs Nano 3 (7), 1844-1858, 2009 | 127 | 2009 |
Dually responsive multiblock copolymers via reversible addition− fragmentation chain transfer polymerization: synthesis of temperature-and redox-responsive copolymers of poly … YZ You, QH Zhou, DS Manickam, L Wan, GZ Mao, D Oupický Macromolecules 40 (24), 8617-8624, 2007 | 126 | 2007 |
Influence of TAT-peptide polymerization on properties and transfection activity of TAT/DNA polyplexes DS Manickam, HS Bisht, L Wan, G Mao, D Oupicky Journal of Controlled Release 102 (1), 293-306, 2005 | 124 | 2005 |
Influence of Nano-Carrier Architecture on in Vitro siRNA Delivery Performance and in Vivo Biodistribution: Polyplexes vs Micelleplexes DJ Gary, H Lee, R Sharma, JS Lee, Y Kim, ZY Cui, D Jia, VD Bowman, ... ACS nano 5 (5), 3493-3505, 2011 | 118 | 2011 |
Bit Patterned Media at 1 Tdot/in2 and Beyond TR Albrecht, D Bedau, E Dobisz, H Gao, M Grobis, O Hellwig, D Kercher, ... IEEE Transactions on Magnetics 49 (2), 773-778, 2013 | 105 | 2013 |
Evolutionary optimization of directed self-assembly of triblock copolymers on chemically patterned substrates GS Khaira, J Qin, GP Garner, S Xiong, L Wan, R Ruiz, HM Jaeger, ... ACS Macro Letters 3 (8), 747-752, 2014 | 83 | 2014 |
Directed Self-Assembly of Triblock Copolymer on Chemical Patterns for Sub-10-nm Nanofabrication via Solvent Annealing S Xiong, L Wan, Y Ishida, YA Chapuis, GSW Craig, R Ruiz, PF Nealey ACS nano 10 (8), 7855-7865, 2016 | 78 | 2016 |
Double-Patterned Sidewall Directed Self-Assembly and Pattern Transfer of Sub-10 nm PTMSS-b-PMOST J Cushen, L Wan, G Blachut, MJ Maher, TR Albrecht, CJ Ellison, ... ACS applied materials & interfaces 7 (24), 13476-13483, 2015 | 71 | 2015 |
Solvent annealing block copolymers on patterned substrates PF Nealey, L Wan US Patent 9,299,381, 2016 | 68 | 2016 |
Topcoat approaches for directed self-assembly of strongly segregating block copolymer thin films H Yoshida, HS Suh, A Ramirez-Herunandez, JI Lee, K Aida, L Wan, ... Journal of Photopolymer Science and Technology 26 (1), 55-58, 2013 | 65 | 2013 |
Image quality and pattern transfer in directed self assembly with block-selective atomic layer deposition R Ruiz, L Wan, J Lille, KC Patel, E Dobisz, DE Johnston, K Kisslinger, ... Journal of Vacuum Science & Technology B 30 (6), 2012 | 64 | 2012 |
Toward 1Tdot∕ in. 2 nanoimprint lithography for magnetic bit-patterned media: Opportunities and challenges XM Yang, Y Xu, C Seiler, L Wan, S Xiao Journal of Vacuum Science & Technology B: Microelectronics and Nanometer …, 2008 | 57 | 2008 |
Fabrication of templates with rectangular bits on circular tracks by combining block copolymer directed self-assembly and nanoimprint lithography L Wan, R Ruiz, H Gao, KC Patel, J Lille, G Zeltzer, EA Dobisz, ... Journal of Micro/Nanolithography, MEMS, and MOEMS 11 (3), 031405-031405, 2012 | 47 | 2012 |
Block copolymer assembly methods and patterns formed thereby S Xiao, XM Yang, Y Xu, L Wan US Patent 8,673,541, 2014 | 43 | 2014 |