Matthew Shaw
Matthew Shaw
Industry Researcher
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Plasma etch technologies for the development of ultra-small feature size transistor devices
D Borah, MT Shaw, S Rasappa, RA Farrell, C O'Mahony, CM Faulkner, ...
Journal of Physics D: Applied Physics 44 (17), 174012, 2011
Sub-10 nm Feature Size PS-b-PDMS Block Copolymer Structures Fabricated by a Microwave-Assisted Solvothermal Process
D Borah, MT Shaw, JD Holmes, MA Morris
ACS Applied Materials & Interfaces 5 (6), 2004-2012, 2013
A general method for controlled nanopatterning of oxide dots: a microphase separated block copolymer platform
T Ghoshal, MT Shaw, CT Bolger, JD Holmes, MA Morris
Journal of Materials Chemistry 22 (24), 12083-12089, 2012
Monitoring PMMA Elimination by Reactive Ion Etching from a Lamellar PS-b-PMMA Thin Film by ex Situ TEM Methods
RA Farrell, N Petkov, MT Shaw, V Djara, JD Holmes, MA Morris
Macromolecules 43 (20), 8651-8655, 2010
Large-scale parallel arrays of silicon nanowires via block copolymer directed self-assembly
RA Farrell, NT Kinahan, S Hansel, KO Stuen, N Petkov, MT Shaw, ...
Nanoscale 4 (10), 3228-3236, 2012
“In situ” hard mask materials: a new methodology for creation of vertical silicon nanopillar and nanowire arrays
T Ghoshal, R Senthamaraikannan, MT Shaw, JD Holmes, MA Morris
Nanoscale 4 (24), 7743-7750, 2012
Size and space controlled hexagonal arrays of superparamagnetic iron oxide nanodots: magnetic studies and application
T Ghoshal, T Maity, R Senthamaraikannan, MT Shaw, P Carolan, ...
Scientific reports 3 (1), 2772, 2013
Surface-directed dewetting of a block copolymer for fabricating highly uniform nanostructured microdroplets and concentric nanorings
RA Farrell, N Kehagias, MT Shaw, V Reboud, M Zelsmann, JD Holmes, ...
ACS nano 5 (2), 1073-1085, 2011
Structural and Magnetic Characterization of Ge0.99Mn0.01 Nanowire Arrays
JS Kulkarni, O Kazakova, D Erts, MA Morris, MT Shaw, JD Holmes
Chemistry of materials 17 (14), 3615-3619, 2005
Synthesis and characterization of highly ordered cobalt–magnetite nanocable arrays
B Daly, DC Arnold, JS Kulkarni, O Kazakova, MT Shaw, S Nikitenko, ...
Small 2 (11), 1299-1307, 2006
Molecularly Functionalized Silicon Substrates for Orientation Control of the Microphase Separation of PS-b-PMMA and PS-b-PDMS Block Copolymer Systems
D Borah, M Ozmen, S Rasappa, MT Shaw, JD Holmes, MA Morris
Langmuir 29 (9), 2809-2820, 2013
Fabrication of ordered, large scale, horizontally aligned Si nanowire arrays based on an in-situ hard mask block copolymer approach
T Ghoshal, R Senthamaraikannan, MT Shaw, JD Holmes, MA Morris
Wiley, 2013
Fabrication of a sub-10 nm silicon nanowire based ethanol sensor using block copolymer lithography
S Rasappa, D Borah, CC Faulkner, T Lutz, MT Shaw, JD Holmes, ...
Nanotechnology 24 (6), 065503, 2013
Orientation and Alignment Control of Microphase-Separated PS-b-PDMS Substrate Patterns via Polymer Brush Chemistry
D Borah, S Rasappa, R Senthamaraikannan, B Kosmala, MT Shaw, ...
ACS Applied Materials & Interfaces 5 (1), 88-97, 2013
Achieving structural control with thin polystyrene-b-polydimethylsiloxane block copolymer films: The complex relationship of interface chemistry, annealing methodology and …
BMD O’Driscoll, RA Kelly, M Shaw, P Mokarian-Tabari, G Liontos, ...
European Polymer Journal 49 (11), 3445-3454, 2013
Study on the combined effects of solvent evaporation and polymer flow upon block copolymer self-assembly and alignment on topographic patterns
TG Fitzgerald, RA Farrell, N Petkov, CT Bolger, MT Shaw, JPF Charpin, ...
Langmuir 25 (23), 13551-13560, 2009
Ordered mesoporous silicate structures as potential templates for nanowire growth
RL Rice, DC Arnold, MT Shaw, D Iacopina, AJ Quinn, H Amenitsch, ...
Advanced Functional Materials 17 (1), 133-141, 2007
Fabrication of highly ordered sub-20 nm silicon nanopillars by block copolymer lithography combined with resist design
M Salaun, M Zelsmann, S Archambault, D Borah, N Kehagias, C Simao, ...
Journal of Materials Chemistry C 1 (22), 3544-3550, 2013
Formation of sub-7 nm feature size PS-b-P4VP block copolymer structures by solvent vapour process
A Chaudhari, T Ghoshal, MT Shaw, C Cummins, D Borah, JD Holmes, ...
Advances in Patterning Materials and Processes XXXI 9051, 254-263, 2014
Block copolymer lithography: feature size control and extension by an over-etch technique
S Rasappa, D Borah, R Senthamaraikannan, CC Faulkner, MT Shaw, ...
Thin Solid Films 522, 318-323, 2012
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